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US 8,137,997 B2Granted
Method and system for tone inverting of residual layer tolerant imprint lithography
AssigneeInternational Business Machine Corporation
InventorsMatthew E. Colburn, Theodore G. van Kessel, Yves C. Martin, Dirk Pfeiffer
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Abstract
A system for imprint lithography, which includes a substrate, a patterned mask, an imprint applying unit that imprints, via the patterned mask, a pattern into a resist layer on the substrate, and an overlay device that overlays a cladding layer over the substrate.
Claims18
A system for imprint lithography, comprising:
- a substrate;
- a patterned mask;
- an imprint applying unit that imprints, via the patterned mask, a pattern into a resist layer on the substrate;
- an overlay device that overlays a cladding layer over the substrate;
- and
- a plurality of feet that supports the patterned mask,
- wherein the feet comprise one of silicon dioxide, silicon nitride and amorphous silicon.
4 more elements
A system for imprint lithography, comprising:
- a substrate;
- a patterned mask;
- an imprint applying unit that imprints, via the patterned mask, a pattern into a resist layer on the substrate;
- an overlay device that overlays a cladding layer over the substrate;
- and
- a plurality of feet that supports the patterned mask,
- wherein the feet are placed by evaporation through the patterned mask, and
- wherein the patterned mask comprises at least one of molybdenum, steel, copper and aluminum.
5 more elements
Dependencies are inferred from the claim text.