Back to results
US 8,137,895 B2Granted
Structure and method for improving photoresist pattern adhesion
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChing-Yu Chang
Life of this patent
Estimating the term…
Abstract
An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains.
Claims20
A device, comprising:
- an anti-reflective coating;
- and
- a photoresist layer having an interface with the anti-reflective coating, wherein the anti-reflective coating includes:
- a plurality of main backbone chains having crosslinkers between parallel polymer chains;
- and
- a first long free polymer chain coupled to and extending from one of the main backbone chains, wherein the first long free polymer chain includes a polymer chain having at least three carbons and a first functional group attached to the polymer chain of the first long free polymer chain, the first long free polymer chain extending into the photoresist layer, the first functional group being one of an acid functional group and a polar functional group.
3 more elements
A semiconductor device, comprising:
- an anti-reflective coating disposed on a substrate and having a main backbone chain that includes crosslinkers, wherein a first long free polymer chain and a second long free polymer chain are coupled to the main backbone chain and include a polymer structure having at least three carbon atoms and at least one functional group coupled to each polymer structure;
- and
- a layer of photoresist on the anti-reflective coating, wherein the first long free polymer chain extends into the layer of photoresist and wherein at least one of the at least one functional group coupled to each polymer structure is the same as a functional group found in the photoresist.
A semiconductor device comprising:
- an anti-reflective coating disposed above a substrate and including:
- a plurality of main backbone chains;
- a plurality of crosslinkers;
- a first acid labile functional unit coupled to the plurality of main backbone chains, wherein the first acid labile functional unit makes the anti-reflective coating hydrophilic;
- and
- at least one long free polymer chain coupled to the plurality of main backbone chains, wherein the at least one long free polymer chain is a polymer having at least three carbons;
- and
- a photoresist layer disposed above the anti-reflective coating and including a greater plurality of crosslinkers than the anti-reflective coating layer and at least one functional group that is the same as the first acid labile functional unit of the anti-reflective coating, and wherein the at least one long free polymer chain extends into the photoresist layer.
5 more elements
Dependencies are inferred from the claim text.