Heated valve manifold for ampoule
AssigneeApplied Materials, Inc.
InventorsKenric T. Choi, Son T. Nguyen
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsKenric T. Choi, Son T. Nguyen
Estimating the term…
Embodiments of the invention provide an apparatus and a method for generating a gaseous chemical precursor that may be used in a vapor deposition processing system. In one embodiment, the apparatus contains a valve manifold assembly, which includes a valve assembly body having at least one embedded electric heater, an inlet channel passing through the valve assembly body, a first pneumatic valve and a first manual valve coupled to the valve assembly body and positioned to control fluid flow within the inlet channel, an outlet channel passing through the valve assembly body, and a second pneumatic valve and a second manual valve coupled to the valve assembly body and positioned to control fluid flow within the outlet channel. The valve manifold assembly further contains a bypass channel connected to and between the inlet and outlet channels, and containing a bypass valve positioned to control fluid flow within the bypass channel.
An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
Dependencies are inferred from the claim text.