Immersion exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKaoru Ogino
Life of this patent
Estimating the term…
Abstract
An exposure apparatus includes a projection optical system configured to project a pattern of an original onto a substrate via a liquid, to expose the substrate to light, a stage mechanism including a stage configured to hold the substrate, an immersion unit configured to supply a liquid to a gap between the substrate or the stage and the projection optical system and to recover the liquid from the gap, and a controller configured to shut off power supply to the immersion unit after determining that recovery of the liquid by the immersion unit is completed up to a target level, if a power-off request is received.
Claims7
An exposure apparatus that includes a projection optical system configured to project a pattern of an original onto a substrate via a liquid to expose the substrate to light, the apparatus comprising:
- a stage mechanism including a stage configured to hold the substrate;
- an immersion unit configured to supply a liquid to a gap between (i) one of the substrate and the stage and (ii) the projection optical system, and to recover the liquid from the gap;
- and
- a controller configured, if the controller receives an emergency shut off request, to shut off power supply to the immersion unit after an elapse of a preset wait time such that at least a part of the liquid is recovered from the gap by the immersion unit.
A method of manufacturing a device, the method comprising:
- (A) exposing a substrate to light using an exposure apparatus;
- (B) developing the exposed substrate;
- and
- (C) processing the developed substrate to manufacture the device,
- wherein the exposure apparatus comprises:
- (a) a projection optical system configured to project a pattern of an original onto the substrate via a liquid to expose the substrate to light;
- (b) a stage mechanism including a stage configured to hold the substrate;
- (c) an immersion unit configured to supply a liquid to a gap between (i) one of the substrate and the stage and (ii) the projection optical system, and to recover the liquid from the gap;
- and
- (d) a controller configured, if the controller receives an emergency shut off request, to shut off power supply to the immersion unit after an elapse of a preset wait time such that at least a part of the liquid is recovered from the gap by the immersion unit.
An exposure apparatus that includes a projection optical system configured to project a pattern of an original onto a substrate via a liquid to expose the substrate to light, the apparatus comprising:
- a stage mechanism including a stage configured to hold the substrate;
- an immersion unit configured to supply a liquid to a gap between (i) one of the substrate and the stage and (ii) the projection optical system, and to recover the liquid from the gap;
- and
- a controller configured, if the controller receives an emergency shut off request, to shut off power supply to the immersion unit after determining that at least a part of the liquid in the gap is recovered by the immersion unit.
A method of manufacturing a device, the method comprising:
- (A) exposing a substrate to light using an exposure apparatus;
- (B) developing the exposed substrate;
- and
- (C) processing the developed substrate to manufacture the device,
- wherein the exposure apparatus comprises:
- (a) a projection optical system configured to project a pattern of an original onto the substrate via a liquid to expose the substrate to light;
- (b) a stage mechanism including a stage configured to hold the substrate;
- (c) an immersion unit configured to supply a liquid to a gap between (i) one of the substrate and the stage and (ii) the projection optical system, and to recover the liquid from the gap;
- and
- (d) a controller configured, if the controller receives an emergency shut off request, to shut off power supply to the immersion unit after determining that at least a part of the liquid in the gap is recovered by the immersion unit.
Dependencies are inferred from the claim text.