Half tone mask having multi-half permeation part and a method of manufacturing the same

A manufacturing method of a half tone mask having a multi semi-transmission part, comprising:

• forming sequentially a light shielding layer and a first photoresist on a transparent substrate and forming a light transmission part for transmitting light and a light shielding part for shielding the light on the light shielding layer by using an exposure process, a development process and an etching process sequentially;
• depositing semi-transmission materials for transmitting only a part of the light with a predetermined wavelength band irradiated on the light shielding part and the light transmission part after removing the first photoresist;
• forming a second photoresist on the semi-transmission material and exposing and developing the second photoresist to expose a part of the semi-transmission material;
• forming a basic semi-transmission part by removing the second photoresist after etching the exposed semi-transmission material;
• depositing the semi-transmission materials on the light transmission part on which the basic semi-transmission part is not formed and forming at least one additional semi-transmission part with light transmission different from the basic semi-transmission part;
• forming each different semi-transmission material on the transparent substrate;
• and
• at least two or more semi-transmission parts having each different light transmission,
• wherein each of the semi-transmission parts is formed as a single layer.

A manufacturing method of a half tone mask having a multi semi-transmission part, comprising:

• forming sequentially a light shielding layer and a first photoresist on a transparent substrate and forming a light transmission part for transmitting light and a light shielding part for shielding the light on the light shielding layer by using an exposure process, a development process and an etching process sequentially;
• after removing the first photoresist and forming a second photoresist on the light transmission part and the light shielding part, exposing and developing the second photoresist to expose a part of the light transmission part, where the semi-transmission part is formed, to the outside;
• depositing the semi-transmission material on an upper part of the light transmission part exposed to the outside and an upper part of the second photoresist;
• forming a basic semi-transmission part by removing the second photoresist and the semi-transmission material deposited on the upper part of the second photoresist by using a lift-off method and remaining the semi-transmission material only on the upper part of the light transmission part exposed to the outside;
• depositing the semi-transmission materials on the light transmission part on which the basic semi-transmission part is not formed and forming at least one additional semi-transmission part with light transmission different from the basic semi-transmission part;
• forming each different semi-transmission material on the transparent substrate;
• and
• at least two or more semi-transmission parts having each different light transmission,
• wherein each of the semi-transmission parts is formed as a single layer.

A manufacturing method of a half tone mask having a multi semi-transmission part, comprising:

• forming a full exposure region and a half exposure region by forming sequentially a semi-transmission material film, a light shielding material film, and a first photoresist, on a transparent substrate, performing a full exposure process and a half exposure process on the first photoresist, and developing the exposed part of the first photoresist;
• etching sequentially the light shielding material film and the semi-transmission material film, all of which are respectively exposed on the full exposure region, so as to form a light transmission part;
• performing an ashing process on the first photoresist to expose the light shielding material film located on the half exposure region to the outside;
• forming a basic semi-transmission part by etching partially the light shielding material film exposed to the outside to expose the semi-transmission material film to the outside and forming a light shielding part by removing the first photoresist;
• forming at least one additional semi-transmission part with light transmission different from the basic semi-transmission part by depositing the semi-transmission material on the light transmission part;
• forming each different semi-transmission material on the transparent substrate;
• and
• at least two or more semi-transmission parts having each different light transmission,
• wherein the basic semi-transmission part and the additional semi-transmission part are formed as a single layer.

A half tone mask having a multi semi-transmission part, comprising:

• a transparent substrate;
• a light transmission part formed on the transparent substrate to transmit irradiation light of a predetermined wavelength band;
• a light shielding part formed on the transparent substrate to shield the irradiation light of the predetermined wavelength band;
• and
• at least two or more semi-transmission parts passing through the light of the predetermined wavelength irradiated on the transparent substrate with each different light transmission,
• wherein the semi-transmission part comprises the combination of a slit type semi-transmission part and a deposition type semi-transmission part;
• the deposition type semi-transmission part deposits is formed by depositing a semi-transmission material film with a single layer;
• and the slit type semi-transmission part comprises many slits on the light shielding part or the deposition type semi-transmission part.

A manufacturing method of a half tone mask having a multi semi-transmission part, comprising:

• forming sequentially a light shielding material film, and a first photoresist, on a transparent substrate, and then forming at least one slit space part on the first photoresist using an exposure process and a development process;
• etching the exposed light shielding material film using the development process and removing the first photoresist so as to form a light shielding part, a light transmission part and a slit type semi-transmission part;
• and
• depositing the semi-transmission material on the light transmission part with a single layer to form at least one deposition type semi-transmission parts having light transmission different from the slit type semi-transmission part.

A manufacturing method of a half tone mask having a multi semi-transmission part, comprising:

• forming sequentially a light shielding material film and a first photoresist on a transparent substrate and forming a light transmission part for transmitting light and a light shielding part for shielding the light on the light shielding layer by using an exposure process, a development process and an etching process sequentially;
• depositing semi-transmission materials for transmitting a part of the light with a predetermined wavelength band on the light transmission part with a single layer to form at least one deposition type semi-transmission part;
• and
• forming a slit type semi-transmission part having light transmission different from the deposition type semi-transmission on at least one of the deposition type semi-transmission part and the light shielding part by forming many slits.