Sputtering system and method using a loose granular sputtering target

A method for performing sputtering, comprising the steps of providing a sputtering system comprising

• a sputtering source having a sputtering medium,
• a sputtering target positioned so as to be impinged upon by the sputtering medium of the sputtering source, wherein the sputtering target comprises a mass of a first loose granular material and wherein each granule has a longest dimension from about 3 millimeters to about 6 millimeters;
• and
• a cooled open-top vessel in which the mass of the first loose granular material of the sputtering target is received and positioned so that the first loose granular material does not fall out of the open-top vessel by gravity;
• thereafter
• sputtering some of the first loose granular material from the sputtering target;
• thereafter
• adding a quantity of a second loose granular material to the mass of the first loose granular material in the open-top vessel;
• and thereafter
• sputtering some of the second loose granular material from the sputtering target.

A sputtering system comprising

• a sputtering source having a sputtering medium;
• a sputtering target positioned so as to be impinged upon by the sputtering medium of the sputtering source, wherein the sputtering target comprises a mass of a first loose granular material and wherein each granule has a longest dimension from about 3 millimeters to about 6 millimeters;
• an open-top vessel in which the mass of the first loose granular material of the sputtering target is received and positioned so that the first loose granular material does not fall out of the open-top vessel by gravity;
• and
• means for affecting the path and/or trajectory of the sputtering medium.

A sputtering system comprising

• a sputtering source having a sputtering medium;
• a sputtering target positioned so as to be impinged upon by the sputtering medium of the sputtering source, wherein the sputtering target comprises a mass of a first loose granular material and wherein each granule has a longest dimension from about 3 millimeters to about 6 millimeters;
• an open-top vessel in which the mass of the first loose granular material of the sputtering target is received and positioned so that the first loose granular material does not fall out of the open-top vessel by gravity;
• and
• means for adding a quantity of a second loose granular material to the mass of the first loose granular material in the open-top vessel during a sputtering operation.