Apparatus for isolated bevel edge clean and method for using the same

A system to clean a portion of an edge of a semiconductor substrate, comprising:

• a substrate supporting device supporting the semiconductor substrate;
• and
• a bristle brush applicator including
• a housing configured to receive the edge of the semiconductor substrate, the housing having a cavity defined within such that the cavity is enclosed by the housing, the cavity in the housing having an opening such that only a selected portion of the semiconductor surface received through the housing extends into the cavity,
• a proximity head located inside the cavity in the housing, the proximity head configured to introduce a meniscus barrier on an outer edge located at a top surface of the selected portion of the semiconductor surface extending inside the cavity;
• a bristle brush unit located inside the cavity in the housing, the bristle brush unit having a plurality of outwardly extending vanes, the bristle brush unit mounted on a rotating shaft and aligned such that the outwardly extending vanes contact an underside of the portion of the edge of the semiconductor substrate extending into the cavity when rotating, wherein the outwardly extending vanes are made from a porous material;
• and
• a fluid distributor channel within the cavity of the housing, the fluid distributor channel configured to introduce cleaning chemistry to the plurality of outwardly extending vanes of the bristle brush unit, the cleaning chemistry providing lubrication during cleaning underside of the portion of the edge of the semiconductor substrate.