Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohannes Adrianus Antonius Theodorus Dams, Mark Kroon, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee
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Abstract
A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.
Claims22
A method of preparing a component of a lithographic projection apparatus to reduce outgassing inside the lithographic projection apparatus, said component comprising at least one of a coil, a magnet, or a yoke of an actuator, said method comprising:
- coating a surface of said component with a polymer;
- and
- coating the polymer with a non-metallic material, wherein said material is glass or a glass-like material, by applying a fluid composition of said material to the polymer.
A component for use in a lithographic projection apparatus, said component comprising at least one of a coil, a magnet, or a yoke of an actuator, and said component having a surface coated with a polymer and at least about 30 nm to about 1 μm of a glass or glass-like material on top of the polymer.
A lithographic projection apparatus comprising:
- a radiation system for providing a beam of radiation;
- a support structure for supporting a patterning device, the patterning device constructed and arranged to pattern the beam of radiation according to a desired pattern;
- a substrate support for supporting a substrate;
- a projection system for projecting the patterned beam onto a target portion of the substrate;
- and
- at least one component disposed within a vacuum chamber of said apparatus, said component comprising at least one of a coil, a magnet, or a yoke of an actuator, said component having a surface coated with a polymer and at least 30 nm to about 1 μm of a non-metallic material on top of the polymer, wherein said material is a glass or glass-like material.
A device manufacturing method comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a beam of radiation using a radiation system;
- using a patterning device to endow the beam with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- and
- using an actuator of a lithographic apparatus within a vacuum chamber of the lithographic apparatus, the actuator comprising a coil, a magnet, and a yoke, at least one of the coil, the magnet, or the yoke having been coated with a polymer and a non-metallic material on top of the polymer, wherein said material is a glass or glass-like material.
A device manufacturing method comprising:
- providing a beam of radiation with a radiation system;
- patterning the beam of radiation with a patterning device;
- projecting the patterned beam of radiation onto a layer of radiation-sensitive material disposed on a substrate;
- and
- moving a support that supports the patterning device or the substrate with an actuator comprising a coil, a magnet, and a yoke, wherein at least one of the coil, the magnet, or the yoke has been coated on a surface thereof with a polymer and at least 30 nm to about 1 μm of a non-metallic material on top of the polymer.
Dependencies are inferred from the claim text.