Thin film transistor substrate and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsEun-Guk Lee, Chang-Oh Jeong, Je-Hun Lee, Do-Hyun Kim, Soon-Kwon Lim
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Abstract
A thin film transistor array substrate comprising a base substrate, a first wire on the base substrate, a first insulating layer on the base substrate to cover the first wire, a semiconductor layer on the first insulating layer, a second insulating layer on the first insulating layer on which the semiconductor layer is formed, and a second wire on the second insulating layer on the second insulating layer is provided, and a portion of the second wire makes contact with the semiconductor layer through the contact hole.
Claims20
A thin film transistor array substrate comprising:
- a base substrate;
- a first wire on the base substrate;
- a first insulating layer on the base substrate to cover the first wire;
- a semiconductor layer on the first insulating layer;
- a second insulating layer on the first insulating layer on which the semiconductor layer is formed, the second insulating layer having a contact hole extending to the semiconductor layer;
- a second wire on the second insulating layer, a portion of the second wire making contact with the semiconductor layer through the contact hole, the second wire including a first conductive layer and a second conductive layer formed on the first conductive layer;
- and
- a pixel electrode including a same layer as the first conductive layer, the pixel electrode making contact with a portion of the second wire.
A manufacturing method of a thin film transistor array substrate comprising:
- forming a first wire on a base substrate;
- forming a first insulating layer on the base substrate to cover the first wire;
- forming a semiconductor layer on the first insulating layer;
- forming a second insulating layer on the first insulating layer on which the semiconductor layer is formed;
- forming a contact hole in the second insulating layer;
- forming a first conductive layer on the second insulating layer;
- forming a second conductive layer on the first conductive layer;
- forming a second wire and a pixel electrode on the second insulating layer by patterning the first and second conductive layers so that a portion of the second wire makes contact with the semiconductor layer through the contact hole, and the pixel electrode includes the first conductive layer and makes contact with a portion of the second wire.
Dependencies are inferred from the claim text.