Substrate processing apparatus and a substrate processing method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorKatsuhiko Miya
Life of this patent
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Abstract
A gas injection head 200 is provided above a substantial center of a substrate W. Nitrogen gas introduced from a gas feed port 291 is injected from a slit-shaped injection port 293 via an internal buffer space BF. In this way, a radial gas flow substantially isotropic in a horizontal direction while having an injection direction restricted in a vertical direction is generated above the substrate. Thus, dust D, mist M and the like around the substrate are blown off in outward directions and do not adhere to the substrate W. The gas injection head 200 can be made smaller than the diameter of the substrate W and needs to be neither retracted from the substrate surface nor rotated, wherefore an apparatus can be miniaturized.
Claims9
A substrate processing apparatus for applying a specified processing to a substrate, comprising:
- a substrate holder which holds the substrate substantially horizontally, and
- a gas injector which is arranged above a substantial center of the substrate held by the substrate holder and radially injects gas,
- wherein the gas injector injects the gas substantially isotropically in a horizontal direction while restricting an injection direction of the gas to a specified range in a vertical direction;
- and
- wherein an injection port for injecting the gas is provided in an outer peripheral portion of the gas injector, the injection port being configured such that a center line of a gas injection range from the injection port in the vertical direction is located between a horizontal line, and a straight line connecting the injection port and a substrate peripheral edge.
A substrate processing method, comprising:
- a substrate holding step of substantially horizontally holding a substrate, and
- a processing step of applying a specified processing to the substrate by injecting gas, from the above of a substantial central part of the substrate, substantially isotropically in a horizontal direction while restricting an injection direction to a specified range in a vertical direction;
- and
- providing an injection port for injecting the gas in an outer peripheral portion of the gas, injector, the injection port being configured such that a center line of a gas injection range from the injection port in the vertical direction is located between a horizontal line, and a straight line connecting the injection port and a substrate peripheral edge.
Dependencies are inferred from the claim text.