Exposure apparatus capable of asymmetrically adjusting light intensity
AssigneeHynix Semiconductor Inc.
InventorsByeong Ho Cho, Dong Sook Chang
Life of this patent
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Abstract
An exposure apparatus of a semiconductor device may include an exposure light source; an asymmetric adjustment filter for asymmetrically adjusting intensity of a light which passes through the exposure light source; a photomask for passing the light of which intensity is adjusted by the asymmetric adjustment filter; a projection lens for projecting the light passing through the photomask; and a wafer stage for mounting a wafer on which an image is formed by the light from the projection lens.
Claims20
An exposure apparatus of a semiconductor device, comprising:
- an exposure light source;
- an asymmetric adjustment filter coupled to the exposure light source and having an asymmetrically adjusted intensity light output;
- a photomask coupled to the asymmetric adjustment filter and passing the asymmetrically adjusted intensity light output;
- a projection lens coupled to the photomask and projecting the photomask output;
- a wafer stage including a wafer mounting to mount and retain a wafer on which an image is formed by the light projected from the projection lens, and
- wherein the asymmetric adjustment filter has a brightness profile that causes brightness to gradually increase from a first position to a second position and brightness to gradually decrease from a third position to the first position and brightness to gradually decrease from a center of the asymmetric adjustment filter to the first position and brightness to gradually increase from the center of the asymmetric adjustment filter to the second position and the third position, wherein the direction of the first position to the second position and the direction of the third position to the first position are substantially perpendicular to each other.
An exposure apparatus of a semiconductor device, comprising:
- an exposure light source;
- an asymmetric adjustment filter for asymmetrically adjusting the intensity of a light which passes through the exposure light source;
- a symmetric adjustment filter positioned at a position downstream of the asymmetric adjustment filter with respect to a direction of propagation of the light to symmetrically adjust the intensity of the light whose intensity is adjusted by the asymmetric adjustment filter;
- a photomask for passing the light of which intensity is adjusted by the asymmetric adjustment filter and the symmetric adjustment filter;
- a projection lens for projecting the light passing through the photomask;
- and
- a wafer stage for mounting a wafer on which an image is formed by the light from the projection lens,
- wherein the asymmetric adjustment filter has a brightness profile that causes brightness to gradually increase from a first position to a second position and brightness to gradually decrease from a third position to the first position and brightness to gradually decrease from a center of the asymmetric adjustment filter to the first position and brightness to gradually increase from the center of the asymmetric adjustment filter to the second position and the third position, wherein the direction of the first position to the second position and the direction of the third position to the first position are substantially perpendicular with each other.
Dependencies are inferred from the claim text.