Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorMakoto Ogusu
Life of this patent
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Abstract
An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.
Claims8
An exposure apparatus that exposes a substrate through a liquid, the apparatus comprising:
- a stage configured to hold the substrate and move;
- and
- a support plate detachably disposed on the stage at an outer periphery of the substrate and configured to support the liquid together with the substrate,
- wherein the support plate includes a liquid-repellent structure portion of which a surface is provided by a plurality of protrusions repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.
A support plate for an exposure apparatus having a stage that holds a substrate and moves and exposing the substrate through a liquid, the support plate being detachably disposed on the stage at an outer periphery of the substrate and being configured to support the liquid together with the substrate, the support plate including a liquid-repellent structure portion of which a surface is provided by a plurality of protrusions repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.
Dependencies are inferred from the claim text.