Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorHans Butler
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Abstract
A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.
Claims19
A lithographic apparatus comprising:
- a patterning device support configured to hold a patterning device, the patterning device capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate support constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a projection system housing supporting internally a plurality of lens elements using mounting elements coupling the plurality of lens elements to the projection system housing;
- and
- a movement damper connected to, and arranged externally of, the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of said plurality of lens elements that are arranged internally of the projection system housing,
- wherein the movement damper is a tuned mass damper, tuned on the eigenfrequency of the at least one of said plurality of lens elements.
A lithographic apparatus comprising:
- a patterning device support configured to hold a patterning device, the patterning device capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate support constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a projection system housing supporting internally a plurality of lens elements using mounting elements coupling the plurality of lens elements to the projection system housing;
- and
- a movement damper connected to, and arranged externally of, the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the said plurality of lens elements that are arranged internally of the projection system housing,
- wherein the movement damper is a tuned mass damper, tuned on the eigenfrequency of the at least one of said plurality of lens elements, and
- wherein the tuned mass damper comprises a mass, a spring and a damper and wherein at least part of the mass of the tuned mass damper is provided by at least part of a lens cooling device.
A method for improving servo performance of a movable stage in a lithographic apparatus, the lithographic apparatus comprising a projection system housing supporting internally a plurality of lens elements using mounting elements coupling the plurality of lens elements to the projection system housing and a controller of the movable stage using a position signal of the projection system housing, the method comprising damping movement of the projection system housing at an eigenfrequency of at least one of said plurality of lens elements using a movement damper connected to, and arranged externally of, the projection system housing, wherein the movement damper is a tuned mass damper, tuned on the eigenfrequency of the at least one of said plurality of lens elements that are arranged internally of the projection system housing.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a target portion of a substrate using a plurality of lens elements supported internally by a projection system housing using mounting elements coupling the plurality of lens elements to the projection system housing;
- and
- damping movement of the projection system housing at an eigenfrequency of at least one of said plurality of lens elements using a movement damper connected to, and arranged externally of, the projection system housing,
- wherein the movement damper is a tuned mass damper, tuned on the eigenfrequency of the at least one of said plurality of lens elements that are arranged internally of the projection system housing.
Dependencies are inferred from the claim text.