Substrate cleaning device and substrate cleaning method

A substrate cleaning device comprising:

• a rotary substrate holding device that horizontally holds a substrate;
• a cleaning liquid pouring nozzle that pours a cleaning liquid onto a surface of a substrate held by the rotary substrate holding device;
• and
• a driving device that moves the cleaning liquid pouring nozzle while the substrate is being rotated so that a region on the surface of the substrate onto which the cleaning liquid poured through the cleaning liquid pouring nozzle moves from a central part toward a circumference of the substrate,
• wherein the cleaning liquid pouring nozzle has a portion which faces the surface of the substrate, the portion of the cleaning liquid pouring nozzle comprises
• a recess having an opening open toward the circumference of the substrate and a V-shape in a plane view having a broader width toward the circumference of the substrate, the recess being formed of a top wall and a side wall standing from an edge of the top wall and surrounding the top wall so as to form the opening,
• a nozzle opening for pouring the cleaning liquid onto the substrate, formed on the top wall of the recess, and
• a liquid damming member, for damming the cleaning liquid poured out through the nozzle opening onto the substrate,
• the liquid damming member being composed of
• a first portion surrounding the recess, including the top wall and the side wall, and
• a second portion extending from an edge of the side wall at a height lower than that of the nozzle opening.