Lithographic apparatus and device manufacturing method

A lithographic apparatus, comprising:

• a table;
• a projection system to project a patterned beam onto a target portion of a substrate;
• a fluid supply system to supply a fluid comprising liquid to a space between the projection system and the table;
• a manifold to mix a first liquid component with a second component to form the fluid before supply to the space;
• a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid;
• and
• a measuring device to measure a property of the fluid and to make feedback available to the controller,
• wherein the controller is configured to control the physical property of the fluid based on the feedback.

A device manufacturing method, comprising:

• providing a lithographic apparatus, comprising a projection system and a fluid supply system to supply a fluid comprising a liquid to a space between the projection system and a table, the lithographic apparatus including a manifold to mix at least a first liquid component with a second component to form the fluid before supply to the space, a controller configured to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device configured to measure a property of the fluid and to make feedback available to the controller;
• mixing in the manifold the first component and the second component to form the fluid;
• measuring a property of the fluid using the measuring device and making the feedback available to the controller;
• based on the feedback, controlling with the controller the physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid;
• and
• supplying the fluid to the space between the projection system and the table.