Method and device for producing exposed structures

Device for producing exposed structures on at least one substrate member by means of an exposure unit, wherein:

• the at least one substrate member arranged on a substrate carrier and the exposure unit are movable relative to one another in a main direction (X) and transversely to the main direction (X) in a secondary direction (Y),
• the exposed structures are producible by way of exposure of the at least one substrate member within a plurality (M) of macrolines (MZ) extending in the main direction (X) and lying next to one another in the secondary direction (Y),
• each of the macrolines (MZ) comprises a plurality (V) of lines (Z) extending in the main direction (X) and lying next to one another in the secondary direction (Y), and
• the exposure unit has a plurality (N) of light sources, a control activating the light sources essentially at the same time, and a control memory designed such that sets of data already stored for the macroline (MZ), in the area of which exposure is being carried out, are readable from said memory while sets of data of an additional macroline (MZ) are being stored.

Method for producing exposed structures in at least one area on at least one substrate member by means of an exposure unit, wherein:

• the at least one substrate member arranged on a substrate carrier and the exposure unit are moved relative to one another in a main direction (X) and transversely to the main direction (X) in a secondary direction (Y),
• structures are produced on the at least one area,
• each of the structures is produced by way of exposure of the at least one substrate member in the at least one area within a plurality (M) of macrolines (MZ) extending in the main direction (X) and lying next to one another in the secondary direction (Y),
• each of the macrolines (MZ) comprises a plurality (V) of lines (Z) extending in the main direction (X) and lying next to one another in the secondary direction (Y),
• during a single pass along a path of exposure (W) the at least one area to be provided with the structures and covered by the path of exposure (W) is exposed with the exposure unit in an area of the same macroline (MZ) of the plurality (M) of macrolines (MZ), and
• the exposure unit has a plurality (N) of light sources, the plurality (N) of light sources being formed from a plurality of groups of light sources,
• each group of light sources having its own group control associated with it and the light sources of the group of light sources is activated and controlled by the group control exclusively and independently of the other groups of light sources,
• the exposure unit having a control memory adapted such that sets of data already stored for the macroline (MZ), in the area of which exposure is being carried out, are able to be read from said memory,
• the control memory communicating via an interface with at least one main memory storing at least the sets of data of the plurality (M) of macrolines (MZ),
• the control memory comprising a plurality of control memory units, at least one of the control memory units being associated with one of said group controls, each control memory unit comprising several control memory modules combined by means of a control module.

Device for producing exposed structures on at least one substrate member by means of an exposure unit, wherein:

• the at least one substrate member arranged on a substrate carrier and the exposure unit are movable relative to one another in a main direction (X) and transversely to the main direction (X) in a secondary direction (Y),
• the exposed structures are producible by way of exposure of the at least one substrate member within a plurality (M) of macrolines (MZ) extending in the main direction (X) and lying next to one another in the secondary direction (Y),
• each of the macrolines (MZ) comprises a plurality (V) of lines (Z) extending in the main direction (X) and lying next to one another in the secondary direction (Y), and
• the exposure unit has a plurality (N) of light sources, the plurality (N) of light sources being formed from a plurality of groups of light sources,
• each group of light sources having its own group control associated with it and the light sources of the group of light sources are controlled by the group control,
• the exposure unit having a control memory designed such that sets of data already stored for the macroline (MZ), in an area of which exposure is being carried out, are readable from said memory,
• the control memory communicating via an interface with at least one main memory storing at least the sets of data of the plurality (M) of macrolines (MZ),
• the control memory comprising a plurality of control memory units, at least one control memory unit being associated with one of said group controls, each control memory unit comprising several control memory modules combined by means of a control module.