Wafer processing method

A wafer processing method of dividing a wafer into individual devices, the wafer having on a front surface a device area sectioned by predetermined dividing lines to form a plurality of the devices, and an external circumferential redundant area surrounding the device area, the wafer processing method comprising:

• a wafer grinding step in which, in a state where the wafer is held on a side of a protection tape stuck to the front surface of the wafer, a rear side of the device area in a rear surface of the wafer is ground to form a recessed portion to form a ringlike reinforcing portion on an outer circumferential side of the recessed portion;
• a metal film coating step for coating, with a metal film, the rear surface of the wafer stuck with the protection tape on the front surface;
• and
• a wafer dividing step for cutting the predetermined dividing lines from a rear surface side of the wafer stuck with the protection tape on the front surface and dividing the wafer into individual devices, further comprising
• a step of forming a notch in an outer circumferential portion on an extension of the predetermined dividing line before the wafer dividing step so that the predetermined dividing line can be detected from the rear surface side of the wafer.