Apparatus for processing a substrate

An apparatus for processing a substrate comprising:

• a substrate holding mechanism which includes a holding plate for holding a target substrate to be processed, the target substrate having a first main face;
• a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for dispensing a first chemical solution onto the first main face and a chemical solution suction port for sucking a chemical solution including the first chemical solution;
• an auxiliary plate having a second main face with a recess portion having a closed bottom portion, the auxiliary plate surrounding the holding plate to form a depressed portion on the holding plate by the auxiliary plate, the depressed portion housing the target substrate held on the holding plate in which the second main face is substantially flush with the first main face, the recess portion for receiving the first chemical solution dispensed from the chemical solution dispensing port, and the recess portion being wider than an area including the chemical solution dispensing port and the chemical solution suction port;
• at least one determining mechanism which determines whether a bubble is present or absent in the chemical solution dispensing port;
• and
• a vibration mechanism which vibrates the first chemical solution and a second chemical solution.