Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsTammo Uitterdijk, Erik Roelof Loopstra, Laurens Anthony Sanderse
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Abstract
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
Claims16
A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final element having, on a surface nearest the substrate, a layer bonded to the surface and comprising an edge barrier, of the same material as the layer, extending away from the layer to shield the final element from a liquid, wherein the edge barrier does not directly contact the final element;
- and
- a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid provided in a space between a final element of a projection system and the substrate,
- wherein a surface of the final element nearest the substrate has a layer bonded to it and an edge barrier of the same material as the layer extends away from the layer to shield the final element from the liquid, wherein the edge barrier does not directly contact the final element.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid provided in a space between a final element of a projection system and the substrate,
- wherein the final element has on a surface nearest the substrate a layer through which the final element is supported, and an edge barrier, not directly in contact with the final element, shields the final element from the liquid.
Dependencies are inferred from the claim text.