Exposure apparatus, exposure method, and method for producing device

An exposure apparatus which exposes a substrate by radiating an exposure beam onto the substrate, the exposure apparatus comprising:

• a first optical member having an exit surface via which the exposure beam exits;
• a first movable body which is movable, while holding the substrate, in a predetermined area including a first area and a second area, the first area including a position opposite to the exit surface of the first optical member and the second area being different from the first area;
• a first holding device which releasably holds a first cover member capable of forming a liquid-retaining space retaining a liquid between the first optical member and the first cover member, such that when the first movable body is away from the first optical member, the first cover member is arranged at the position opposite to the exit surface of the first optical member;
• and
• an exchange system which exchanges the first cover member for a second cover member different from the first cover member while forming the liquid-retaining space between the first optical member and the exchange system,
• wherein the exchange system includes:
• a second holding device which is arranged at a first position on the first movable body and which is capable of holding the first cover member released from the first holding device;
• and
• a third holding device which is arranged at a second position on the first movable body and which releasably holds the second cover member.