Semiconductor component with terminal contact surface
Assigneeaustriamicrosystems AG
InventorsRainer Minixhofer, Verena Vescoli
Life of this patent
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Abstract
At least one terminal contact surface (1) is formed on a topmost metal plane (2). Under it, in a secondmost metal plane (3), is a reinforcement region (8), in which the secondmost metal plane (3) is structured within its two-dimensional extent such that a part of the area of the vertical (with respect to the metal plane) projection of the terminal contact surface (1) onto the secondmost metal plane (3) that is occupied by the metal of the secondmost metal plane (3) amounts to at least one third of the area.
Claims10
A semiconductor device with a terminal contact surface, comprising:
- metal planes with intermetal dielectric, comprising at least one topmost metal plane and a secondmost metal plane;
- at least one terminal contact surface formed on the topmost metal plane;
- and
- the secondmost metal plane being structured such that at least one-third of an area obtained by a projection of the terminal contact surface into the secondmost metal plane, the projection being perpendicular with respect to the metal plane, is occupied by the metal of the secondmost metal plane, and at least a portion of said area allows a gapless cover with affine triangles such that an affine mapping that maps one of the triangles onto another triangle will map the structure of the secondmost metal plane in the former triangle into the structure of the secondmost metal plane in the latter triangle.
A semiconductor device with a terminal contact surface, comprising:
- metal planes with intermetal dielectric, comprising at least one topmost metal plane and a secondmost metal plane;
- at least one terminal contact surface formed on the topmost metal plane;
- the secondmost metal plane being structured such that at least one-third of an area obtained by a projection of the terminal contact surface into the secondmost metal plane, the projection being perpendicular with respect to the metal plane, is occupied by the metal of the secondmost metal plane;
- and
- the secondmost metal plane being structured, in at least a portion of said area, into one or more strips having segments that are arranged parallel to one another, at least one of the strips forming a conductive track with boustrophedonic change of direction.
Dependencies are inferred from the claim text.