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US 8,013,419 B2Granted
Structure and method to form dual silicide e-fuse
AssigneeInternational Business Machines Corporation
InventorsDeok-Kee Kim, Ahmet S Ozcan, Haining S Yang
Life of this patent
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Abstract
An e-fuse structure and method has anode, a fuse link, and a cathode. The first end of the fuse link is connected to the anode and the second end of the fuse link opposite the first end is connected to the cathode. This structure also includes a first silicide layer on the anode and the fuse link and a second silicide layer, different than the first silicide layer, on the cathode. The difference between the first silicide layer and the second silicide layer causes an enhanced flux divergence region at the second end of the fuse link.
Claims3
An e-fuse structure comprising:
- an anode;
- a fuse link, a first end of said fuse link being connected to said anode;
- a cathode, a second end of said fuse link opposite said first end being connected to said cathode;
- a first silicide layer on said anode and said fuse link;
- and
- a second silicide layer different than said first silicide layer on said cathode and on a portion of said fuse link proximate said second end of said fuse link,
- a difference between said first silicide layer and said second silicide layer causing an enhanced flux divergence region at a small portion of said second end of said fuse link near said cathode.
4 more elements
Dependencies are inferred from the claim text.