Delivery of vapor precursor from solid source
AssigneeASM International N.V.
InventorTheodorus G. M. Oosterlaken
Life of this patent
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Abstract
A method is disclosed that uses solid precursors for semiconductor processing. A solid precursor is provided in a storage container. The solid precursor is transformed into a liquid state in the storage container. The liquid state precursor is transported from the storage container to a liquid holding container. The liquid state precursor is transported from the liquid holding container to a reaction chamber. The molten precursor allows the precursor to be metered in the liquid state. The storage container can be heated only when necessary to replenish the liquid holding container, thereby reducing the possibility of thermal decomposition of the precursor.
Claims17
A method for semiconductor processing comprising:
- providing a precursor in a solid state in a storage container;
- intermittently heating the storage container to a temperature above the melting temperature of the precursor, thereby intermittently transforming the precursor from the solid state into a liquid state in the storage container;
- flowing the precursor, while in the liquid state, from the storage container into a liquid holding container;
- and
- flowing the precursor from the liquid holding container to a reaction chamber.
Dependencies are inferred from the claim text.