Optical imaging device having at least one system diaphragm

A variable system diaphragm for a microlithographic projection exposure apparatus having a multiplicity of plates held in a mobile fashion by means of solid state articulations;

• and
• wherein each mobile plate is rotatably mounted on a pivot axis defined by the solid state articulations, wherein each pivot axis extends through a center of curvature (C) of a sphere, and wherein the sphere is defined as a single spherical surface in which the mobile plates move relative to one another.

A variable system diaphragm having a multiplicity of mobile plates, the plates having a spherical curvature and being rotationally mounted, rotational bearing axes of the plates being aligned with a center of curvature (C) of a sphere, and the sphere determining a single surface on which the plates are mobile relative to one another.

A projection objective in semiconductor lithography having optical elements, at least one variable system diaphragm for a microlithographic projection exposure apparatus being provided for introduction into a concave surface of an optical element, the diaphragm following a curved surface;

• and
• wherein the diaphragm comprises a plurality of mobile plates, each mobile plate is rotatably mounted on a pivot axis, wherein each pivot axis extends through a center of curvature (C) of a sphere, and wherein the sphere is defined as a single spherical surface in which the mobile plates move relative to one another.

An optical imaging device comprising:

• at least one system diaphragm, the system diaphragm comprising a multiplicity of mobile plates, each mobile plate is rotatably mounted on a pivot axis, wherein the pivot axis extends through a center of curvature (C) of a sphere, and wherein the sphere is defined as a surface in which the mobile plates move relative to one another;
• and
• wherein at least two of the mobile plates are arranged to rotate on respective pivot axes in an overlapping configuration on two different spherical surfaces, the two different spherical surfaces having an identical center of curvature (C).

An optical imaging device, in particular an objective for semiconductor lithography, having at least one system diaphragm, the system diaphragm comprising a multiplicity of mobile plates which are rotatably mounted, wherein the plates have a spherical curvature;

• and
• wherein the mobile plates are movable by means of a drive ring, the drive ring being mounted rotatably about an optical axis via solid state articulations.

An optical imaging device, in particular an objective for semiconductor lithography, having at least one system diaphragm, the system diaphragm comprising a multiplicity of mobile plates which are rotatably mounted, wherein the plates have a spherical curvature;

• wherein a drive unit for moving the plates is arranged outside a gas space (G);
• and
• wherein the multiplicity of the mobile plates is arranged inside the gas space (G).

An optical imaging device, in particular an objective for semiconductor lithography, having at least one system diaphragm, the system diaphragm comprising a multiplicity of mobile plates which are rotatably mounted, wherein the plates have a spherical curvature;

• wherein a drive unit for moving the plates is arranged outside a gas space (G);
• and
• wherein the at least one system diaphragm is arranged inside the gas space (G).