Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorHiroyuki Wada
Life of this patent
Estimating the term…
Abstract
This invention provides an exposure apparatus configured to expose a pattern of an original on a substrate through a projection optical system. The apparatus comprises a holding unit configured to hold the projection optical system, at least three anti-vibration mounts configured to support the holding unit, and at least three supporting members configured to support the at least three anti-vibration mounts respectively. The at least three supporting members are independent of each other without connecting to each other.
Claims12
An exposure apparatus configured to expose a pattern of an original on a substrate through a projection optical system, the apparatus comprising:
- a holding unit configured to hold the projection optical system;
- at least three anti-vibration mounts configured to support the holding unit;
- at least three supporting members configured to support the at least three anti-vibration mounts respectively;
- a base structure configured to support at least one of an original stage which holds the original, an illumination optical system which illuminates the original with exposure illumination light, a conveyance device which conveys the original, and a conveyance device which conveys the substrate;
- a position detector configured to detect a relative position of the holding unit with respect to the base structure;
- and
- a controller configured to control at least one of a distance between the base structure and the holding unit and an angle of tilt of the holding unit based on an output from the position detector,
- wherein the at least three supporting members are independent of each other without connecting to each other, and
- wherein the base structure are independent of the supporting members without connecting to the supporting members.
An exposure apparatus configured to expose a pattern of an original on a substrate through a proiection optical system, the apparatus comprising:
- a holding unit configured to hold the projection optical system;
- at least three anti-vibration mounts configured to support the holding unit;
- at least three supporting members configured to support the at least three anti-vibration mounts respectively;
- a base structure configured to support at least one of an original stage which holds the original, an illumination optical system which illuminates the original with exposure illumination light, a conveyance device which conveys the original, and a conveyance device which conveys the substrate;
- a vibration sensor configured to sense vibration of the holding unit;
- and
- a force actuator configured to generate a force decreasing the vibration of the holding unit between the base structure and the holding unit based on an output from the vibration sensor,
- wherein the at least three supporting members are independent of each other without connecting to each other, and
- wherein the base structure are independent of the supporting members without connecting to the supporting members.
A method of manufacturing a device, the method comprising:
- exposing a substrate using an exposure apparatus;
- developing the exposed substrate;
- and
- processing the developed substrate to manufacture the device,
- wherein the exposure apparatus comprises:
- a projection optical system;
- a holding unit configured to hold the projection optical system;
- at least three anti-vibration mounts configured to support the holding unit;
- and
- at least three supporting members configured to support the at least three anti-vibration mounts respectively;
- a base structure configured to support at least one of an original stage which holds the original, an illumination optical system which illuminates the original with exposure illumination light, a conveyance device which conveys the original, and a conveyance device which conveys the substrate;
- a position detector configured to detect a relative position of the holding unit with respect to the base structure;
- and
- a controller configured to control at least one of a distance between the base structure and the holding unit and an angle of tilt of the holding unit based on an output from the position detector,
- the at least three supporting members being independent of each other without connecting to each other,
- the base structure being independent of the supporting members without connecting to the supporting members.
A method of manufacturing a device, the method comprising:
- exposing a substrate using an exposure apparatus;
- developing the exposed substrate;
- and
- processing the developed substrate to manufacture the device,
- wherein the exposure apparatus comprises:
- a projection optical system;
- a holding unit configured to hold the projection optical system;
- at least three anti-vibration mounts configured to support the holding unit;
- at least three supporting members configured to support the at least three anti-vibration mounts respectively;
- a base structure configured to support at least one of an original stage which holds the original, an illumination optical system which illuminates the original with exposure illumination light, a conveyance device which conveys the original, and a conveyance device which conveys the substrate;
- a vibration sensor configured to sense vibration of the holding unit;
- and
- a force actuator configured to generate a force decreasing the vibration of the holding unit between the base structure and the holding unit based on an output from the vibration sensor,
- the at least three supporting members being independent of each other without connecting to each other,
- the base structure being independent of the supporting members without connecting to the supporting members.
Dependencies are inferred from the claim text.