Semiconductor device and semiconductor device manufacturing method

A semiconductor device comprising:

• a semiconductor substrate;
• a first insulating film formed above the semiconductor substrate and having a relative dielectric constant of 3.8 or less;
• a conductor provided outside the first insulating film and covering an outer side face of the first insulating film at least near four corners of the semiconductor substrate, the conductor including a conductive barrier layer on at least an outer side face thereof;
• and
• a second insulating film provided on the first insulating film and on an outer side face of the conductor, the second insulating film covering the outer side face of the conductor and having a relative dielectric constant of over 3.8,
• wherein the first insulating film and the second insulating film are positioned so as to directly sandwich the conductor at least at a first horizontal level above the semiconductor substrate and also at a second horizontal level higher than the first horizontal level above the semiconductor substrate.