Manufacturing methods of asymmetric bumps and pixel structure

A manufacturing method of a pixel structure, comprising:

• providing a substrate, the substrate having an active device region and a pixel region;
• forming an active device in the active device region of the substrate;
• forming a film layer on the substrate;
• providing a complex photomask, comprising at least one transparent region, a plurality of opaque regions and a plurality of semi-transparent regions, wherein each of the plurality of semi-transparent regions is disposed between two of the plurality of opaque regions adjacent to each other, and at least one light-shielding pattern is randomly disposed in each of the plurality of semi-transparent regions;
• patterning the film layer with use of the complex photomask, wherein a plurality of asymmetric bumps in the pixel region of the substrate is formed and a drain of the active device is exposed;
• and
• forming a pixel electrode in the pixel region of the substrate, the pixel electrode being electrically connected to the drain and covering the plurality of asymmetric bumps.