Immersion lithography fluids
AssigneeAir Products and Chemicals, Inc.
InventorsPeng Zhang, Bridgette Maria Budhlall, Gene Everad Parris, Leslie Cox Barber
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Abstract
Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 365 nm are disclosed herein.
Claims17
An immersion fluid having a transmission of 50% or greater of a total transmission at an operating wavelength ranging from 140 nm to 248 nm comprising:
- at least one carrier medium selected from the group consisting of bicyclohexyl, glycerol, and cis-2-methylcyclohexanol;
- and
- about 1 ppm to a maximum solubility limit of at least one additive selected from the group consisting of an alkyl alcohol;
- an alkyl ethoxylate, an alkyl propoxylate;
- an alkyl acid ester;
- an alkyl amine comprising an amine group;
- an alkyl amine ethoxylate;
- an acetylenic alcohol, an acetylenic diol comprising an ethylene oxide;
- an acetylenic diol comprising a propylene oxide;
- an alkyl polyglycoside;
- a block oligomer;
- a polymer of ethylene and propylene oxide;
- a glycidyl ether;
- a glucamine derivative of a glycidyl ether;
- a urea;
- a siloxane-containing compound;
- a fluorinated or partially fluorinated acetylenic alcohol;
- and a fluorinated or partially fluorinated acetylenic alcohol diol.
A method of forming a pattern on a substrate coated with a layer of photoresist, the method comprising the steps of:
- introducing a fluid between the layer of photoresist on the substrate and a lens having an operating wavelength ranging from 140 nm to 365 nm, wherein the fluid comprises:
- at least one carrier medium selected from the group consisting of an aqueous fluid, a non-aqueous fluid, and a mixture of the aqueous fluid and the non-aqueous fluid wherein the at least one carrier medium has a refractive index greater than or equal to water at the operating wavelength;
- and
- about 1 ppm to a maximum solubility limit of at least one additive selected from the group consisting of an alkyl alcohol;
- an alkyl ethoxylate, an alkyl propoxylate;
- an alkyl acid ester;
- an alkyl amine comprising an amine group;
- an alkyl amine ethoxylate;
- an acetylenic alcohol;
- an acetylenic diol comprising an ethylene oxide;
- an acetylenic alcohol comprising a propylene oxide;
- an alkyl polyglycoside;
- a block oligomer;
- a polymer of ethylene and propylene oxide;
- a glycidyl ether;
- a glucamine derivative of a glycidyl ether;
- a urea;
- a siloxane-containing compound;
- a fluorinated or partially fluorinated acetylenic alcohol;
- a fluorinated or partially fluorinated acetylenic alcohol diol;
- a fluorosurfactant;
- an ionic liquid;
- a salt;
- and an electrolyte, provided that if the at least one additive is a fluorosurfactant then the immersion fluid comprises about 1% by weight or greater of an aqueous fluid;
- and
- exposing the layer of the photoresist on the substrate through the fluid to form a pattern upon the photoresist.
A method of forming a pattern on a substrate coated with a layer of photoresist, the method comprising the steps of:
- introducing a fluid between the layer of photoresist on the substrate and a lens having an operating wavelength ranging from 140 nm to 365 nm, wherein the fluid comprises:
- at least one carrier medium selected from the group consisting of:
- an aqueous fluid, a non-aqueous fluid, and a mixture of the aqueous fluid and the non-aqueous fluid, wherein the at least one carrier medium has a refractive index greater than or equal to water at the operating wavelength;
- and
- about 10 ppm to a maximum solubility limit of at least one additive selected from the group consisting of:
- an alkyl alcohol, a polymeric alcohol having one or more hydroxyl groups, and combinations thereof;
- and
- exposing the layer of the photoresist on the substrate through the fluid to form a pattern upon the photoresist.
An immersion fluid having a transmission of 50% or greater of a total transmission at an operating wavelength ranging from 140 nm to 365 nm comprising:
- a non-aqueous solvent wherein the non-aqueous solvent comprises bicyclohexyl.
Dependencies are inferred from the claim text.