Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsRyoji Watanabe, Takehiro Seshimo, Takeshi Iwai
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Abstract
A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.
Claims6
A resist composition comprising a resin component (A) that displays changed alkali solubility under action of acid, an acid generator component (B) that generates acid upon exposure and an organic solvent (S), wherein
- the organic solvent (S) comprises an aromatic organic solvent (S1),
- wherein the aromatic organic solvent (S1) comprises anisole.
Dependencies are inferred from the claim text.