Back to results
US 8,007,962 B2Granted
Photomask
AssigneeSony Corporation
InventorsKeisuke Hatano, Takeshi Matsunuma, Shinji Miyazawa
Life of this patent
Estimating the term…
Abstract
A photomask includes a base, a plurality of chip pattern regions over which a light shielding pattern of a metal material is defined, the plurality of chip pattern regions being defined on the base, scribe regions defined between the chip pattern regions, the scribe regions being defined by using the light shielding pattern, and slits in which the light shielding pattern is not defined, the slits being defined so as to surround the chip pattern regions.
Claims7
A photomask comprising:
- a base having a first surface and an opposite second surface and fabricated from an electrically non-conductive material;
- a light shielding pattern fabricated from metal material and disposed on and adhering to the first surface of the base;
- a plurality of chip pattern regions formed on the light shielding pattern;
- scribe regions defined between the chip pattern regions, the scribe regions being defined by using the light shielding pattern;
- and
- slits formed into and through the light shielding pattern and to the first surface of the base to define electrically-isolated chip pattern region areas, the slits surrounding the electrically-isolated chip pattern region areas to electrically isolate the electrically-isolated chip pattern region areas from either a remaining portion of the light shielding pattern disposed outside of the electrically-isolated chip pattern region areas or adjacent ones of other electrically-isolated chip pattern region areas.
3 more elements
Dependencies are inferred from the claim text.