Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
AssigneeSamsung Mobile Display Co., Ltd.
InventorsHan-Ki Kim, Myung-Soo Huh, Myoung-Soo Kim, Kyu-Sung Lee
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Abstract
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
Claims19
A catalytic enhanced chemical vapor deposition apparatus comprising:
- a deposition chamber;
- a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
- a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber;
- and
- a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern, the filament including a plurality of sub-filaments, each of the sub-filaments forming a straight line, the sub-filaments parallel to each other and formed such that a distance between the nearest sub-filaments formed around an edge part of the pattern is narrower than the distance between the nearest sub-filaments formed an central part of the pattern.
A catalytic enhanced chemical vapor deposition apparatus comprising:
- a deposition chamber;
- a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
- a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber;
- and
- a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern, the pattern being asymmetric.
A catalytic enhanced chemical vapor deposition apparatus comprising:
- a deposition chamber;
- a shower head for storing a deposition source gas, the showerhead including at least two electrodes;
- a plurality of gas nozzles formed on the shower head and coupled to the deposition chamber for spraying the deposition source gas into inside of the deposition chamber;
- and
- a filament formed on the shower head and disposed between the plurality of gas nozzles and a substrate on which a deposition is made, the filament being coupled to the electrodes, the filament formed into a pattern having a loop shape surrounding the gas nozzles.
Dependencies are inferred from the claim text.