Heating apparatus, heating method, and computer readable storage medium
AssigneeTokyo Electron Limited
InventorsTatsuya Kawaji, Yuichi Sakai, Masatoshi Kaneda
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AssigneeTokyo Electron Limited
InventorsTatsuya Kawaji, Yuichi Sakai, Masatoshi Kaneda
Estimating the term…
A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber; a heating plate that is arranged in the process chamber and includes a heating element for heating the substrate; plural protrusions arranged on the heating plate so as to support the substrate; plural suction holes formed in the heating plate so as to attract by suction the substrate toward the heating plate; and a gas inlet adapted to supply a second gas to a gap between the heating plate and the substrate supported by the plural protrusions.
A heating apparatus for heating a substrate on which a film is coated, the apparatus comprising:
Dependencies are inferred from the claim text.