Composition for forming anti-reflective coat

A process for manufacturing a semiconductor device, characterized by comprising the steps of:

• coating an anti-reflective coating forming composition on a substrate and baking it to form an anti-reflective coating;
• wherein the anti-reflective coating forming composition comprises a resin produced by a condensation reaction between compounds of formula (1),
• wherein R1 and R2 are independently of each other hydrogen atom or an alkyl group, R3 and R4 are independently of each other hydrogen atom, methyl group, ethyl group, hydroxymethyl group or an alkoxymethyl group, and an acid and/or acid generator,
• the resin produced from the condensation reaction between compounds of formula (1) has a weight average molecular weight of 200 to 500,000, and
• the resin produced from compounds of formula (1) is contained in an amount of more than 50 mass % in a solid content of the anti-reflective coating forming composition;
• forming a photoresist on top of the anti-reflective coating;
• exposing the substrate covered with the anti-reflective coating and the photoresist with a light;
• developing it;
• transferring an image on the substrate by etching to form an integrated circuit device.