Method of determining photo mask, method of manufacturing semiconductor device, and computer program product

A method of manufacturing a semiconductor device, comprising:

• specifying a mask pattern for a photo mask for a first exposure apparatus, the first exposure apparatus being used for illuminating a photo mask;
• specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, the second exposure apparatus being used for illuminating a photo mask and being different from the first exposure apparatus;
• predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions;
• predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions;
• determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions;
• determining that the photo mask for which the first exposure apparatus is used to illuminate is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions;
• and
• allowing the second exposure apparatus to project the mask pattern of the photo mask on a substrate, on the basis of the determination that the photo mask for which the first exposure apparatus is used to illuminate is applicable to the second exposure apparatus.

A method of manufacturing a semiconductor device, comprising:

• specifying a mask pattern for a photo mask for a first exposure apparatus, the first exposure apparatus being used for illuminating a photo mask;
• specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, the second exposure apparatus being used for illuminating a photo mask and being different from the first exposure apparatus;
• predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions;
• predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions;
• determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions;
• determining that the photo mask for which the first exposure apparatus is used to illuminate is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions;
• determining that the photo mask is inapplicable to the second exposure apparatus if the processed pattern does not meet the predetermined condition for any of the exposure conditions;
• producing a new photo mask on the basis of the determination that the photo mask is inapplicable to the second exposure apparatus;
• and
• allowing the second exposure apparatus to project a mask pattern of the new photo mask on a substrate.

A computer program stored on a non-transitory computer-readable medium configured to store program instructions for execution on a computer, the program instructions causing the computer to perform:

• specifying a mask pattern for a photo mask for a first exposure apparatus, the first exposure apparatus being used for illuminating a photo mask;
• specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, the second exposure apparatus being used for illuminating a photo mask and being different from the first exposure apparatus;
• predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions;
• predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions;
• determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions;
• and
• determining that the photo mask for which the first exposure apparatus is used to illuminate is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.