Exposure device
AssigneeORC Manufacturing Co., Ltd.
InventorTakashi Okuyama
Life of this patent
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Abstract
The present invention relates to an exposure device for forming circuit patterns onto a surface of an object. The exposure device includes at least one spatial light modulator which includes a plurality of reflection elements being arranged in a matrix fashion, at least one optical source which supplies exposure light to the reflection elements, and a bias voltage controller which applies a first voltage to the reflection elements, thereby setting the reflection elements to a first state and which does not apply a voltage to the reflection elements, thereby setting the reflection elements to a second state. In addition, the exposure light is delivered to the surface of the object in the first state, and the exposure light is not delivered to the surface of the object in the second state.
Claims9
An exposure device for forming circuit patterns onto a surface of an object, comprising:
- at least one spatial light modulator including a plurality of reflection elements being arranged in a matrix fashion;
- at least one optical source supplying exposure light to the reflection elements;
- and
- a bias voltage controller applying a bias voltage to the reflection elements;
- a control section monitoring an intensity of the exposure light;
- wherein when the bias voltage is a first voltage, the reflection elements are set to a first state in which the exposure light is delivered to the surface of the object;
- wherein when the bias voltage is not supplied, the reflection elements are set to a second state in which the exposure light is not delivered to the surface of the object and is not measured by the control section;
- and
- wherein when the bias voltage is a third voltage, the reflection elements are set to a third state in which the exposure light is not delivered to the surface of the object and is measured by the control section.
Dependencies are inferred from the claim text.