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US 7,924,404 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorAntonius Johannus Van Der Net
Life of this patent
Estimating the term…
Abstract
A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.
Claims19
A lithographic projection apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid, the liquid supply system comprising an outlet configured to remove a mixture of liquid and gas;
- and
- an evacuation system configured to draw the mixture of liquid and gas through the outlet, the evacuation system comprising:
- a manifold configured to receive the mixture of liquid and gas from the outlet and to provide the mixture toward a separator without removal of liquid from the mixture at the manifold,
- a gas inlet configured to supply the manifold with a flow of gas,
- the separator in fluid communication with the manifold and configured to receive the mixture of liquid and gas from the manifold, and to separate gas from the mixture,
- a pump arranged to apply suction to the separated gas in the separator, and
- a control system configured to measure a pressure in the manifold and to control the pressure in the manifold by controlling the flow of gas into the manifold from the gas inlet in response to the measured pressure.
7 more elements
An apparatus to control removal of a mixture of liquid and gas, the apparatus comprising:
- a manifold configured to receive the mixture of liquid and gas and to provide the mixture toward a separator without removal of liquid from the mixture at the manifold;
- a gas inlet configured to supply the manifold with a flow of gas;
- the separator in fluid communication with the manifold and configured to receive the mixture of liquid and gas from the manifold, and to separate gas from the mixture;
- a pump arranged to apply suction to the separated gas in the separator;
- and
- a control system configured to measure a pressure in the manifold and to control the pressure in the manifold by controlling the flow of gas into the manifold from the gas inlet in response to the measured pressure.
3 more elements
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through a liquid onto a substrate;
- receiving a mixture of the liquid and a gas into a manifold;
- receiving the mixture of liquid and gas, from the manifold, into a separator without removal of liquid from the mixture at the manifold;
- separating gas from the mixture in the separator;
- applying suction to the separated gas;
- measuring a pressure in the manifold;
- and
- controlling the pressure in the manifold by controlling a flow of gas into the manifold in response to the measured pressure.
5 more elements
Dependencies are inferred from the claim text.