Exposure apparatus and device manufacturing method
AssigneesNikon Corporation, Tokyo Electron Limited
InventorsHiroyuki Nagasaka, Taro Yamamoto, Osamu Hirakawa
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Abstract
An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.
Claims5
An exposure apparatus which forms a liquid immersion area at one part on a substrate, and which exposes the substrate by irradiating an exposure light to the substrate via liquid which forms the liquid immersion area, comprising:
- a projection optical system via which the substrate is irradiated by the exposure light;
- a liquid supply device having a liquid supply port, which supplies the liquid for forming the liquid immersion area that covers only a portion of a surface of the substrate during exposure of the substrate;
- and
- a detecting device which detects an outer boundary of the liquid immersion area in plan view, wherein
- the detecting device includes at least one pair of sensors including a first sensor and a second sensor,
- the first sensor is disposed at a position closer to an optical axis of the exposure apparatus than the second sensor, and
- the detecting device is configured to detect the liquid between the first sensor and the second sensor on an outer side of the liquid immersion area with respect to the optical axis of the exposure apparatus.
A manufacturing method which forms a liquid immersion area at one part on a substrate, and which exposes the substrate by irradiating an exposure light to the substrate via liquid which forms the liquid immersion area, comprising:
- irradiating the substrate with the exposure light via a projection optical system;
- supplying a liquid via a liquid supply device having a liquid supply port, which supplies the liquid for forming the liquid immersion area that covers only a portion of a surface of the substrate during exposure of the substrate;
- and
- detecting an outer boundary of the liquid immersion area in plan view with a detecting device, wherein
- the detecting device includes at least a pair of sensors including a first sensor and a second sensor,
- the first sensor is disposed at a position closer to an optical axis of the exposure apparatus than the second sensor, and
- the detecting device is configured to detect the liquid between the first sensor and the second sensor on an outer side of the liquid immersion area with respect to the optical axis of the exposure apparatus.
Dependencies are inferred from the claim text.