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US 7,924,401 B2Granted
Seal ring arrangements for immersion lithography systems
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsBurn Jeng Lin, Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Shinn Sheng Yu, Jen Chieh Shih
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Abstract
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.
Claims17
A sealing apparatus for use during an immersion lithographic process, the sealing apparatus comprising:
- a wafer platform for holding up a wafer;
- a first circular seal ring covering a predetermined portion of the wafer peripheral area for preventing an immersion fluid from leaking through the covered portion of the wafer peripheral area during the immersion lithographic process;
- a roller module for rolling up the first circular seal ring when the first circular seal ring is not in use;
- and
- a flat ring surface substantially in parallel to the wafer platform, the flat ring surface surrounding the wafer on the wafer platform and supporting a predetermined portion of the first circular seal ring overlaying the edge of the wafer.
2 more elements
A method for sealing the peripheral area of a wafer during an immersion lithographic process, the method comprising:
- holding the wafer to a predetermined position;
- placing a first circular seal ring covering a predetermined portion of the wafer peripheral area for preventing an immersion fluid from leakage through the covered portion of the wafer peripheral area during the immersion lithographic process;
- rolling up the first circular seal ring when the first circular seal ring is not in use;
- and
- providing a flat ring surface substantially in parallel to the wafer surface, the flat ring surface surrounding the wafer and supporting a predetermined portion of the first circular seal ring overlaying the edge of the wafer.
2 more elements
Dependencies are inferred from the claim text.