Optical apparatus and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorShinichi Shima
Life of this patent
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Abstract
An optical apparatus including an optical element includes a holder configured to hold the optical element, and a rectifier configured to rectify a flow of gas in a space adjacent to a surface of the optical element, and to decrease the flow rate of the gas adjacent to the surface of the optical element.
Claims2
An exposure apparatus for exposing a substrate to light via an original plate in a chamber in which a gas flow is generated by an atmosphere conditioner, the apparatus comprising:
- an original plate stage configured to hold the original plate;
- a stage base configured to support the original plate stage;
- a projection optical system configured to project a pattern of the original plate onto the substrate, the projection optical system including a plurality of optical elements;
- a holder configured to hold the plurality of optical elements;
- and
- a cylindrical or conical rectifier provided on the projection optical system side of the stage base and configured to decrease the flow rate of the gas adjacent to the surface of an optical element that is the closest to stage base among the plurality of optical elements.
An exposure apparatus for exposing a substrate to light via an original plate in a chamber in which a gas flow is generated by an atmosphere conditioner, the apparatus comprising:
- an original plate stage configured to hold the original plate;
- and
- a scope provided above the original plate stage and configured to optically detect a mark for aligning the original plate and the substrate, the scope including an optical element;
- a projection optical system configured to project a pattern of the original plate onto the substrate;
- a holder configured to hold the optical element;
- and
- a rectifier provided on the holder and configured to decrease the gas flow adjacent to the optical element.
Dependencies are inferred from the claim text.