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US 7,923,180 B2Granted
Cross technology reticles
AssigneeChartered Semiconductor Manufacturing Ltd.
InventorsSia Kim Tan, Guoxiang Ning, Gek Soon Chua, Soon Yoeng Tan, Byoung Il Choi, Jason Phua
Life of this patent
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Abstract
A method of fabricating a device is presented. The method includes forming a mask that includes multiple images. A substrate is patterned using the mask. An image of the multiple images corresponds to a respective patterning process. The substrate is processed further to complete the processing of the substrate to form the desired function of the device.
Claims18
A method of fabricating a device comprising:
- forming a mask comprising multiple images, wherein the multiple images comprise compatible technologies;
- patterning a substrate using the mask, wherein the multiple images correspond to respective patterning processes;
- and
- continue processing of the substrate to complete processing of the substrate to form the desired function of the device.
1 more element
A mask for device fabrication comprising:
- a mask substrate;
- and
- a plurality of images formed on the mask substrate, wherein the plurality of images are technology node compatible, wherein an image corresponds to a different patterning process used to fabricate one or more devices.
A method for forming a mask used in device fabrication comprising:
- providing a mask substrate;
- and
- forming a plurality of images on the mask substrate, wherein the plurality of images comprise compatible technologies, wherein an image corresponds to a different patterning process used to fabricate one or more devices.
Dependencies are inferred from the claim text.