Method and system for providing optical proximity correction for structures such as a PMR nose
AssigneeWestern Digital (Fremont), LLC
InventorsXianzhong Zeng, Hai Sun, Hongping Yuan, Dujiang Wan, Ling Wang
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Abstract
An optical mask for providing a pattern for portion of an electronic device, such as a magnetic recording transducer, is disclosed. The optical mask includes a device feature and at least one detached correction feature. The device feature includes a corner corresponding to a device corner of the pattern. The device corner has an angle of greater than zero degrees and less than one hundred eighty degrees. The at least one detached correction feature resides in proximity to but is physically separated from the corner. Each of the at least one detached correction feature is sub-resolution.
Claims26
An optical mask for providing a pattern for a portion of an electronic device, the optical mask comprising:
- a device feature including a corner corresponding to a device corner of the pattern, the device corner having an angle different from ninety degrees;
- and
- at least one detached correction feature residing in proximity to and physically separated from the corner, each of the at least one detached correction feature being sub-resolution, the at least one detached correction feature corresponding to the corner and the device corner.
An optical mask for providing a pattern for portion of a magnetic recording transducer, the optical mask comprising:
- a pole nose portion including a corner corresponding to a pole nose corner of the pattern, the pole nose corner having an angle of more than ninety degrees and less than one hundred eighty degrees;
- and
- at least one detached bar residing in proximity to and separate from the corner, each of the at least one detached bar being a sub-resolution feature, the at least one detached bar corresponding to the corner and the pole nose corner.
A method for providing a pattern for portion of an electronic device comprising:
- providing an optical mask including a mask pattern having a device feature and at least one detached correction feature, the device corner having an angle different from ninety degrees, the at least one detached correction feature residing in proximity to and physically separated from the corner, each of the at least one detached correction feature being sub-resolution, the at least one detached correction feature corresponding to the corner and the device corner;
- optically transferring the mask pattern to a resist layer to provide a resist mask having the pattern;
- and
- forming the portion of the electronic device using the resist mask.
Dependencies are inferred from the claim text.