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US 7,888,720 B2Granted
Semiconductor device including conductive lines with fine line width and method of fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyeoung-Won Seo, Byung-Hyug Roh, Seong-Goo Kim, Sang-Min Jeon
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Abstract
A semiconductor device comprises a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed, a first conductive line and a second conductive line extending to the first core region across the cell array region, and a third conductive line and a fourth conductive line extending to the second core region across the cell array region, wherein a line width of the first through fourth conductive lines is smaller than a resolution limit in a lithography process.
Claims6
A semiconductor device comprising:
- a semiconductor substrate including a first core region and a second core region between which a cell array region is interposed;
- a first conductive line and a second conductive line extending to the first core region across the cell array region;
- and
- a third conductive line and a fourth conductive line extending to the second core region across the cell array region
- wherein the first and second conductive lines are spaced apart from each other by a first distance in the cell array region and are spaced apart from each other by a second distance in the first core region, wherein the second distance is greater than the first distance, and
- wherein the third and fourth conductive lines are spaced apart from each other by the first distance in the cell array region and are spaced apart from each other by the second distance in the second core region.
3 more elements
Dependencies are inferred from the claim text.