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US 7,887,996 B2Granted
Method of pattern transfer
AssigneeNanya Technology Corporation
InventorsHung-Jen Liu, Cheng-Ku Chiang
Life of this patent
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Abstract
Pattern transfer is achieved by forming a first patterned hard mask layer with a circuit pattern and a plurality of dummy patterns on a substrate, forming a second pattern mask layer on the substrate, exposing the circuit pattern of the first pattern mask layer, and removing a portion of the substrate exposed by the first patterned mask layer, so as to transfer the circuit pattern to the substrate.
Claims20
A method of pattern transfer comprising:
- providing a substrate;
- forming a first patterned hard mask layer on the substrate and the first patterned hard mask layer comprising a circuit pattern and a plurality of dummy patterns;
- forming a second patterned hard mask layer on the substrate to expose the circuit pattern on the first patterned hard mask layer;
- and
- partially removing the substrate by using the first patterned hard mask layer as a mask for transferring the circuit pattern to the substrate.
2 more elements
Dependencies are inferred from the claim text.