Positive resist composition and pattern forming method using the same
AssigneeFUJIFILM Corporation
InventorsKazuyoshi Mizutani, Kaoru Iwato, Kunihiko Kodama, Masaomi Makino
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Abstract
A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
Claims4
A positive resist composition, which comprises:
- (A) a resin containing a repeating unit represented by formula (I);
- and
- (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:
- wherein AR represents a benzene ring or a naphthalene ring;
- R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group;
- Z represents a linking group for forming a ring together with AR and is an alkylene group;
- and
- A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group.
Dependencies are inferred from the claim text.