Gas introducing mechanism and processing apparatus for processing object to be processed
AssigneeTokyo Electron Limited
InventorsKenjiro Koizumi, Naoki Yoshii
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AssigneeTokyo Electron Limited
InventorsKenjiro Koizumi, Naoki Yoshii
Estimating the term…
The present invention provides a gas introducing mechanism and a processing apparatus for processing an object to be processed, which can supply a gas uniformly over the whole region of a processing space so as to enhance uniformity of a process in the surface of the object to be processed. The gas introducing mechanism 50, which is adapted to provide a process to the object W to be processed, by using the gas, in a processing vessel 4, includes a gas introducing ring member 54 for introducing the gas from the exterior of the processing vessel 4, a disk-like rotary base 56 provided rotatably below a top plate 48 in the processing vessel 4, and a ring-shaped gas injection ring member 60 provided around a rotary base 56 so as to be closer and opposed to the gas introducing ring member 54. A gas injecting slit 58 is provided in the ring-shaped gas injection ring member 60, the slit 58 being formed along the circumferential direction of the rotary base. A ring-shaped gas guide groove 62 is provided on at least either one of opposing side faces of the gas introducing ring member 54 and gas injection ring member 60, along the circumferential direction, corresponding to a gas introducing port.
A gas introducing mechanism, which is installed in a tubular processing vessel having a side wall and a top plate for storing an object to be processed therein, and which is configured to provide a predetermined process to the object to be processed by introducing a predetermined gas into the processing vessel, the gas introducing mechanism comprising:
A processing apparatus for providing a predetermined process to an object to be processed, comprising:
Dependencies are inferred from the claim text.