Controlling device for substrate processing apparatus and method therefor

A control method for controlling a substrate processing apparatus that performs a specified process on a substrate, the control method comprising:

• storing in a storage unit a plurality of recipes that respectively indicate different processing sequences, and a specified target value that serves as a control value when the specified process is performed on the substrate;
• causing a measuring device to measure measurement information including a pre-processing state and a post-processing state of the substrate that is processed by the substrate processing apparatus in accordance with a processing sequence indicated in a first recipe included among the plurality of recipes stored in the storage unit;
• receiving the measured measurement information;
• computing a feedback value that corresponds to a processed state of the substrate processed in the current cycle, based on pre-processing state and post-processing state measurement information for the substrate processed in a current cycle within the received measurement information;
• updating, via an update unit, the target value stored in the storage unit using the computed feedback value;
• changing a recipe that indicates the processing sequence performed in the substrate processing apparatus from the first recipe to the second recipe, the first recipe and a second recipe is stored in the storage unit;
• and
• controlling a processing of a substrate transferred in the substrate processing apparatus with feed forward control while using the updated target value, in accordance with the processing sequence indicated in the second recipe,
• wherein the second recipe is different from the first recipe, but uses the target value updated by the update unit,
• wherein the storage unit stores a plurality of feed forward plans that respectively indicate a processing sequence for performing feed forward control, each feed forward plan including the target value,
• wherein a process execution control unit accesses the plurality of feed forward plans stored in the storage unit,
• wherein even if the recipe that indicates the processing sequence performed in the substrate processing apparatus is changed from the first recipe to the second recipe, the same feed forward plan is selected, and
• wherein the process execution control unit continues to use the target value contained in the same feed forward plan that has been selected to perform feed forward control for a substrate transferred in the substrate processing apparatus.

A storage medium that stores a control program for a substrate processing apparatus that performs a specified process on a substrate, to control the substrate processing apparatus by executing the control program with a computer, the control program comprising:

• a module that stores in a storage unit a plurality of recipes that respectively indicate different processing sequences, and a specified target value that serves as a control value when the specified process is performed on the substrate;
• a module that causes a measuring device to measure measurement information including a pre-processing state and a post-processing state of the substrate that is processed by the substrate processing apparatus in accordance with a processing sequence indicated in a first recipe included among the plurality of recipes stored in the storage unit;
• a module that receives the measurement information;
• a module that computes a feedback value that corresponds to a processed state of the substrate processed in the current cycle, based on the pre-processing state and the post-processing state measurement information for the substrate processed in the current cycle within the received measurement information;
• a module that updates, via an update unit, the target value stored in the storage unit using the computed feedback value;
• a module that changes a recipe that indicates the processing sequence performed in the substrate processing apparatus from the first recipe to the second recipe, the first recipe and a second recipe is stored in the storage unit;
• and
• a module that controls a processing of a substrate transferred in the substrate processing apparatus with feed forward control while using the updated target value, in accordance with the processing sequence indicated in the second recipe,
• wherein the second recipe is different from the first recipe, but uses the target value updated by the update unit,
• wherein the storage unit stores a plurality of feed forward plans that respectively indicate a processing sequence for performing feed forward control, each feed forward plan including the target value,
• wherein the module that controls processing of a substrate accesses the plurality of feed forward plans stored in the storage unit,
• wherein even if the module that changes a recipe changes the recipe that indicates the processing sequence performed in the substrate processing apparatus from the first recipe to the second recipe, the same feed forward plan is selected, and
• wherein the module that controls processing of a substrate continues to use the target value contained in the same feed forward plan that has been selected to perform feed forward control for a substrate transferred in the substrate processing apparatus.