Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
AssigneeASML Netherlands B.V.
InventorsBauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Abstract
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
Claims15
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus, the cleaning tool comprising:
- a sonic transducer;
- a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned;
- a barrier positioned, in use, in the reservoir under the aperture to form a shield to sonic waves;
- and
- an outlet in the barrier configured to allow flow of liquid therethrough out of the reservoir, the outlet being a physically separate structure from a liquid confinement structure configured to confine liquid between a projection system and a substrate table of the immersion lithographic apparatus during projection of a patterned beam onto a substrate.
A combination of a liquid confinement system and a cleaning tool, wherein the liquid confinement system comprises an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus and the cleaning tool is configured to clean a surface of the liquid confinement system, the cleaning tool comprising:
- a sonic transducer;
- a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned;
- a barrier positioned, in use, in the reservoir under the aperture to form a shield to sonic waves;
- and
- an outlet in the barrier configured to allow flow of liquid therethrough out of the reservoir, the outlet being a physically separate structure from a liquid confinement structure configured to confine liquid between a projection system and a substrate table of the immersion lithographic apparatus during projection of the beam of radiation onto a substrate.
Dependencies are inferred from the claim text.