Temperature control method of epitaxial growth apparatus

A method for controlling the temperature of an epitaxial growth apparatus having an upper pyrometer above a mass-production susceptor and a lower pyrometer below the mass-production susceptor to grow an epitaxial layer on a mass-production substrate mounted onto the susceptor based on the temperature readings of both the upper and lower pyrometers, comprising:

• performing a first calibration for calibrating the upper pyrometer by a thermocouple mounted to a temperature calibrating susceptor previously set in place of the mass-production susceptor;
• adjusting a measured value of the lower pyrometer to a calibrated value of the upper pyrometer;
• setting a correlation line between a temperature of a sample substrate indirectly measured by the upper pyrometer at the time of epitaxial growth onto the sample substrate previously mounted onto the mass-production susceptor instead of the mass-production substrate and haze of the sample substrate measured immediately after epitaxial growth;
• indirectly measuring a temperature (Tx) of the mass production substrate by the upper pyrometer at the time of epitaxial growth onto the mass-production substrate;
• estimating a temperature (Ty) of the mass production substrate at the time of epitaxial growth onto the mass-production substrate by applying the haze of the mass-production substrate measured immediately after the epitaxial growth to the correlation line;
• and
• performing a second calibration for adjusting the measured temperature (Tx) of the upper pyrometer to the estimated temperature (Ty) of the mass production substrate.