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US 7,804,583 B2Granted
EUV reticle handling system and method
AssigneeNikon Corporation
InventorsAlton H. Phillips, Michael R. Sogard, Douglas C. Watson
Life of this patent
Estimating the term…
Abstract
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
Claims9
A method for conveying a reticle comprising:
- covering a first surface of the reticle by a first cover;
- covering a second surface of the reticle by a second cover;
- placing the reticle in a reticle carrier that covers the first cover and the second cover and applies a clamping force to the reticle;
- opening the reticle carrier;
- opening a first gate of a first enclosed station;
- conveying the reticle into the first enclosed station with the first cover and the second cover in contact with each other;
- closing the first gate of the first enclosed station;
- changing the inner condition of the first enclosed station from an atmospheric condition to a vacuum condition;
- opening a second gate of the first enclosed station;
- conveying the reticle with the first cover and the second cover in contact with each other from the first enclosed station to a second enclosed station which has a vacuum condition;
- after conveying the reticle from the first enclosed station to the second enclosed station, releasing the contact between the first cover and the second cover;
- and
- separating the reticle from the second cover.
10 more elements
A method for conveying a reticle, comprising:
- conveying a reticle on a reticle stage from an exposure position to a covering position;
- covering a first surface of the reticle with a first cover;
- conveying the reticle along with the first cover from the reticle stage to a first station having a vacuum condition;
- covering a second surface of the reticle with a second cover while the reticle is in the first station;
- opening a first gate of a second station;
- conveying the reticle with the first cover and the second cover in contact with each other from the first station to the second station;
- closing the first gate;
- changing the inner condition of the second station from a vacuum condition to an atmospheric condition;
- opening a second gate of the second station;
- and
- after conveying the reticle to the second station, placing the reticle in a reticle carrier that covers the first cover and the second cover and applies a clamping force to the reticle.
8 more elements
A method for conveying a reticle comprising:
- opening a reticle carrier that covers a first cover and a second cover of a reticle and applies a clamping force to the reticle;
- opening a first gate of a first enclosed station;
- conveying the reticle covered by the first cover and the second cover into the first enclosed station with the first cover and the second cover in contact with each other;
- closing the first gate of the first enclosed station;
- changing the inner condition of the first enclosed station from an atmospheric condition to a vacuum condition;
- opening a second gate of the first enclosed station;
- conveying the reticle with the first cover and the second cover in contact with each other from the first enclosed station to a second enclosed station which has a vacuum condition;
- after conveying the reticle from the first enclosed station to the second enclosed station, releasing the contact between the first cover and the second cover;
- and
- separating the reticle from the second cover.
7 more elements
Dependencies are inferred from the claim text.