Exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorKyoichi Miyazaki
Life of this patent
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Abstract
An exposure apparatus that exposes a substrate to a pattern of an original. An illumination optical system illuminates the original. A projection optical system projects the pattern that is illuminated by the illumination optical system onto the substrate. A vacuum chamber houses at least one of the illumination optical system and the projection optical system. A heat absorber, arranged in the vacuum chamber, absorbs heat in the vacuum chamber. A heat conductor includes a metal member and connects the heat absorber and a wall of the vacuum chamber. The metal member is softer than the heat absorber and the wall, and fills a space between the heat absorber and the wall, and a cooler, arranged outside the vacuum chamber, cools the wall.
Claims8
An exposure apparatus that exposes a substrate to a pattern on an original, the apparatus comprising:
- an illumination optical system configured to illuminate the pattern on the original;
- a projection optical system configured to project the pattern on the original, which is illuminated by the illumination optical system, onto the substrate;
- a vacuum chamber configured to house at least one of the illumination optical system and the projection optical system;
- a heat absorbing plate disposed over an inner surface of a wall of the vacuum chamber and configured to absorb heat in the vacuum chamber;
- a heat conductor that includes a metal member that is softer than the heat absorbing plate and the wall of the vacuum chamber, and that fills a space between the heat absorbing plate and the wall of the vacuum chamber to bring the heat absorbing plate and the wall into close contact;
- and
- a cooler arranged outside the vacuum chamber and configured to cool the wall of the vacuum chamber.
Dependencies are inferred from the claim text.